Remove Photoresist with Oxygen Plasma
in Plasmatherm 790:
Pressure=100 mTorr, O2=50 sccm, Power=200 W, Time=2 min
posted by Hongzheng @ 4:43 PM
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Monday, February 21, 2005
Pressure=100 mTorr, O2=50 sccm, Power=200 W, Time=2 min
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