Monday, February 21, 2005

PFOTS SAM growth

PFOTS monolayer self-assembly on SiO2 layer, which is also true for Si wafer when there is a thin oxide layer on the surface.
Use photoresist to pattern the wafer surface since PFOTS will only self-assembly on exposed surface regions.
  • No Water! And thus no acetone, isopropanol, methanol. Work in glove box.
  • Soap photoresit patterned dry wafer in dodecane for 5 minute
  • Add several drops of PFOTS in dodecane and stay for 5 minutes. During summer days when the humidity is high, increase this soap time to 20 minutes in order to achieve a fairly good result.
  • Rinse in DI water, blow dry
  • Use TCE (trichloroethylene) to wash the dish

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