AZ5214 as a negative photoresist

1. Clean sample with acetone, isopropanol and blow dry. Bake
2. Spin on HMDS use recipe 1 (4,000 rpm, 40 sec);
3. Spin on AZ5214 use recipe 1 (4,000 rpm, 40 sec);
4. Soft bake at 95 C for 1 min 15 sec use hotplate;
5. Exposure with mask, 30 sec (MA6);
6. Bake at 110 C for 1 min;
7. Flush exposure without mask for 1 min 30 sec (MA6);
8. Develop use MIF312 : DI = 1 : 1 for 40 sec.

--from I-Chun Cheng